Behavior of a microwave cavity discharge over a wide range of pressures and flow rates

IEEE Transactions on Plasma Science

Volumn 6, Issue 4, 1978, Pages 341-354

  Mallavarpu, R ^a   Asmussen, J ^a   Hawley, M C ^a  

^a MICHIGAN STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROWAVE PLASMA GENERATION;

PLASMAS;

EID: 0018046032     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/TPS.1978.4317141     Document Type: Article

References (20)

1. F.K. McTaggart, Plasma Chemistry in Electrical Discharges, London, England, Elsevier (1967).
2. S.F. Mertz et al., IEEE Trans. on Plasma Sci. PS-2, 297(1974).
3. A.I. Maksimov, Sov. Phys.—Tech. Phys. 11, 1316 (1967).
4. M. Moisan et al., IEE Conf. Pub. 143, 382 (1976).
5. R.G. Bosisio et al., J. Micr. Power 7, 325 (1972).
6. R.G. Bosisio et al., IEEE Trans. on Plasma Sci. PS-2, 273 (1974).
7. M. Moisan et al., IEEE Trans. on Plasma Sci. PS-3, 55 (1975).
8. G. Lisitano et al., Appl. Phys. Let. 16, 122 (1970).
9. F.C. Fehsenfeld et al., Rev. Sci. Instr. 36, 294 (1965).
10. J. Asmussen et al., Proc. IEEE 62, 109 (1974).
11. B. Agdur and B. Enander, J. Appl. Phys. 33, 575 (1962).
12. J.L. Shohet and C. Moskowitz, J. Appl. Phys. 36, 1756 (1965).
13. S.J. Buchsbaum et al., Phys. Fluids 35, 806 (1960).
14. M.A.W. Vlachos and H.C.S. Hsuan, J. Appl. Phys. 39, 5009(1968).
15. C.J. Burkiey and M.C. Sexton, J. Appl. Phys. 39, 5013 (1968).
16. R.M. Fredericks, Ph.D. Dissertation, Michigan State University (1971).
17. R. Mallavarpu, Ph.D. Dissertation, Michigan State University (1976).
18. J. Asmussen et al., in Proc. 2nd Topical Conference on RF Plasma Heating, Texas Tech University, Lubbock, Texas, C4, 1 (1974).
19. R. Mallavarpu et al., in 2nd IEEE Int. Conf. on Plasma Science, Ann Arbor (1975), paper 5C1.
20. F.H. Dorman and F.K. McTaggart, J. Micr. Power 5, 4 (1970).