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Volumn 49, Issue 10, 1978, Pages 5188-5198
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Comparative study of annealed neon-, argon-, and krypton-ion implantation damage in silicon
a b b |
Author keywords
[No Author keywords available]
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Indexed keywords
SEMICONDUCTING SILICON;
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EID: 0018024294
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.324414 Document Type: Article |
Times cited : (93)
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References (30)
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