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Volumn 49, Issue 10, 1978, Pages 5188-5198

Comparative study of annealed neon-, argon-, and krypton-ion implantation damage in silicon

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON;

EID: 0018024294     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.324414     Document Type: Article
Times cited : (93)

References (30)
  • 6
    • 84951885488 scopus 로고    scopus 로고
    • Proc. 6th Eur. Conf. Electron Microscopy, Jerusalem, 1976, (unpublished).
    • , vol.1 , pp. 192
    • Cullis, A.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.