Structure of Porous Silicon Layer and Heat-Treatment Effect

Journal of the Electrochemical Society

Volumn 125, Issue 8, 1978, Pages 1339-1344

  Unagami, Takashi ^a   Seki, Masahiro ^a  

^a Musashino Electrical Communication Lab   (Japan)

Author keywords

film structure; heat treatment; porous silicon

Indexed keywords

SEMICONDUCTING SILICON;

EID: 0018005322     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2131674     Document Type: Article

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