SCOPUS 정보 검색 플랫폼

Volumn 49, Issue 7, 1978, Pages 3993-3997

Characteristics of resist films produced by spinning

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE - MASKS;

PHOTORESISTS;

FILMS;

EID: 0017996995 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.325357 Document Type: Article

Times cited : (598)

References (8)

3
- 0017464264
- A recent paper by ] attempts to calculate the thickness of spun films without taking evaporation into account. This is done by making an unrealistic approximation of no or little outward flow. It results in a radial dependence of the thickness [Eq. (8) of their paper], whereas the exact calculation of the fluid distribution without evaporation predicts a uniform thickness (Ref. 1).
- (1977) IBM J. Res. Develop , vol.21 , pp. 190
- Washo, B.D.¹

4
- 61849136226
- (Eastman Kodak Co., Rochester, New York, )
- (1967) Proceedings of the Second Kodak Seminar on Microminiaturization , pp. 36
- Damon, G.F.¹

5
- 0003688580
- (Butterworths, London,) Chap5.
- (1955) Optical Properties of Thin Films
- Heavens, O.S.¹

8
- 84952789717
- (1934) Proc. Cambridge Philos. Soc , vol.30 , pp. 365
- Cochran, W.G.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.