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Journal of Applied Physics

Volumn 49, Issue 6, 1978, Pages 3386-3391

Electron trapping in electron-beam irradiated SiO2

(3) Aitken, J M a Young, D R a Pan, K b

a IBM T J WATSON RESEARCH CENTER (United States)

b MASSACHUSETTS INSTITUTE OF TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; FILMS - DIELECTRIC; SEMICONDUCTOR DEVICES, MIS; SILICA - THIN FILMS;

MOS CAPACITORS;

DIELECTRIC MATERIALS;

EID: 0017981430 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.325241 Document Type: Article

Times cited : (132)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.