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Volumn 125, Issue 5, 1978, Pages 798-803

Optical Monitoring of the Etching of SiO2 and Si3N4 on Si by the Use of Grating Test Patterns

Author keywords

etch depth; etch rate; plasma etching; underetching; wet etching

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0017971329     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2131551     Document Type: Article
Times cited : (39)

References (15)
  • 3
    • 84966530852 scopus 로고
    • Physics and Technology of Semiconductor Devices
    • J. Wiley and Sons Inc. New York
    • A.S. Grove, “Physics and Technology of Semiconductor Devices,” p. 326, J. Wiley and Sons Inc. New York (1967).
    • (1967) , pp. 326
    • Grove, A.S.1
  • 9
    • 84975375675 scopus 로고
    • Etching
    • H.G. Hughes and M.J. Rand, Editors, The Electrochemical Society Softbound Symposium Series, Princeton, N.J.
    • R.G. Poulsen and M. Brochu, “Etching,” H.G. Hughes and M.J. Rand, Editors, p. Ill, The Electrochemical Society Softbound Symposium Series, Princeton, N.J. (1976).
    • (1976) , pp. Ill
    • Poulsen, R.G.1    Brochu, M.2
  • 11
    • 0005187436 scopus 로고
    • Semiconductor Silicon 1977
    • H.R. Huff and E. Sirtl, Editors, The Electrochemical Society Softbound Symposium Series, Princeton, N.J.
    • R.G. Poulsen and G.M. Smith in, “Semiconductor Silicon 1977,” H.R. Huff and E. Sirtl, Editors, p. ‘ 1058, The Electrochemical Society Softbound Symposium Series, Princeton, N.J. (1977).
    • (1977) , pp. 1058
    • Poulsen, R.G.1    Smith, G.M.2
  • 14
    • 21144454509 scopus 로고
    • Principles of Optics
    • Pergamon Press, Inc., Elmsford, N.Y.
    • M. Born and E. Wolf “Principles of Optics,” p. 401403, Pergamon Press, Inc., Elmsford, N.Y. (1965).
    • (1965) , pp. 401403
    • Born, M.1    Wolf, E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.