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Volumn 125, Issue 5, 1978, Pages 798-803
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Optical Monitoring of the Etching of SiO2 and Si3N4 on Si by the Use of Grating Test Patterns
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Author keywords
etch depth; etch rate; plasma etching; underetching; wet etching
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Indexed keywords
INTEGRATED CIRCUIT MANUFACTURE;
SEMICONDUCTOR DEVICE MANUFACTURE;
ETCHING;
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EID: 0017971329
PISSN: 00134651
EISSN: 19457111
Source Type: Journal
DOI: 10.1149/1.2131551 Document Type: Article |
Times cited : (39)
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References (15)
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