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Journal of Applied Physics

Volumn 49, Issue 5, 1978, Pages 2717-2724

Proton-enhanced diffusion and vacancy migration in silicon

(2) Masters, B J a Gorey, E F a

a IBM (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON;

EID: 0017971166 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.325193 Document Type: Article

Times cited : (50)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.