REACTIVE ION ETCHING OF ALUMINUM AND ALUMINUM ALLOYS IN AN RF PLASMA CONTAINING HALOGEN SPECIES.

J Vac Sci Technol

Volumn 15, Issue 2, 1978, Pages 334-337

  Schaible, P M ^a   Metzger, W C ^a   Anderson, J P ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM AND ALLOYS;

EID: 0017943798     PISSN: None     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.569540     Document Type: Article

References (11)