Relative ion sputtering yield measurements by integration of secondary ion energy distribution using a retarding-dispersive Ion energy analyzer

Applied Physics

Volumn 14, Issue 1, 1977, Pages 89-97

  Krauss, A R ^a   Gruen, D M ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

79.20

Indexed keywords

ION ENERGY ANALYZERS;

MASS SPECTROMETERS;

EID: 0017536430     PISSN: 03403793     EISSN: 14320649     Source Type: Journal    
DOI: 10.1007/BF00882637     Document Type: Article

References (36)

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5. Processus de formation d'ions à partir d'atomes éjectés dans des états électroniques surexcités lors du bombardement ionique des métaux de transition
6. The energy spectra of sputtered ions
7. Mass and energy analysis of positive ions emitted from metallic targets bombarded by heavy ions in the keV energy region
8. Effect of entry conditions on ion transmission in a quadrupole field
9. On the energy distribution of sputtered clusters
10. Secondary ion emission from polycrystalline molybdenum: Energy and angular distributions