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Volumn 23, Issue 6, 1976, Pages 1580-1585

Dependence of interface-state buildup on hole generation and transport in irradiated MOS capacitors

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICES - SEMICONDUCTOR INSULATOR BOUNDARIES;

EID: 0017217554     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/TNS.1976.4328543     Document Type: Article
Times cited : (119)

References (28)
  • 7
    • 0015331567 scopus 로고
    • J. Appl. Phys.
    • J. R. Brews, J. Appl. Phys. j43, 2306 ‘1966’.
    • (1966) , vol.j43 , pp. 2306
    • Brews, J.R.1
  • 10
    • 84939711672 scopus 로고
    • HDL-CR-75-013-1.
    • C. T. Sah, HDL-CR-75-013-1 ‘1975’.
    • (1975)
    • Sah, C.T.1
  • 14
    • 84939769337 scopus 로고    scopus 로고
    • Calibrated by the Far Ultraviolet Physics Section at NBS.
    • Calibrated by the Far Ultraviolet Physics Section at NBS.
  • 23
    • 84939764895 scopus 로고
    • Ph.D. Dissertation, Princeton University.
    • C. Chang, Ph.D. Dissertation, Princeton University ‘1976’.
    • (1976)
    • Chang, C.1
  • 24
    • 84939697235 scopus 로고    scopus 로고
    • Hole Transport and Recovery Characteristics of M0S Gate Insulators”
    • ‘This conference’.
    • F. B. McLean, H. E. Boesch, Jr., and J. M. McGarrity, “Hole Transport and Recovery Characteristics of M0S Gate Insulators”, ‘This conference’.
    • McLean, F.B.1    Boesch, H.E.2    McGarrity, J.M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.