The Diffusion of Ion-Implanted Arsenic in Silicon

Journal of the Electrochemical Society

Volumn 122, Issue 12, 1975, Pages 1689-1696

  Fair, Richard B ^a   Tsai, Joseph C C ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

arsenic diffusion; electrical activity; ion implantation; solubility

Indexed keywords

ARSENIC - DIFFUSION;

SEMICONDUCTING SILICON;

EID: 0016665988     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2134111     Document Type: Article

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