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Volumn 22, Issue 7, 1975, Pages 452-456

In-Situ Measurement of Dielectric Thickness During Etching or Developing Processes

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0016522738     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1975.18160     Document Type: Article
Times cited : (89)

References (1)
  • 1
    • 0001506523 scopus 로고
    • IOTA, a new computer controlled thin film thickness measurement tool
    • K. L. Konnerth and F. H. Dill, “IOTA, a new computer controlled thin film thickness measurement tool,” Solid-State Electron., vol. 15, pp. 371-380, 1972.
    • (1972) Solid-State Electron. , vol.15 , pp. 371-380
    • Konnerth, K.L.1    Dill, F.H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.