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Volumn 21, Issue 11, 1974, Pages 701-712

The Effects of Bulk Traps on the Performance of Bulk Channel Charge-Coupled Devices

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE-COUPLED DEVICES;

EID: 0016128631     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1974.17997     Document Type: Article
Times cited : (94)

References (18)
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  • 2
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  • 5
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    • W. J. Bertram et al., “A three-level metallization three-phase CCD,” to be published.
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    • L. J. M. Esser, “The peristaltic charge coupled device: a new type of charge-transfer device,” Electron. Lett., vol. 8, pp. 620–621, 1972.
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    • Esser, L.J.M.1
  • 8
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    • Statistics of recombination of holes and electrons
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  • 9
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    • Overlapping gates buried channel and charge-coupled devices
    • A. M. Mohsen, R. W. Bower, T. C. McGill, and T. A. Zimmerman, “Overlapping gates buried channel and charge-coupled devices,” Electron. Lett., vol. 9, pp. 396–397, 1973.
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  • 10
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    • A. M. Mohsen, T. C. McGill, and C. A. Mead, “Charge transfer in overlapping gate charge coupled devices,” IEEE J. Solid-State Circuits, vol. SC-8, pp. 191–207, June 1973.
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  • 11
  • 12
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  • 14
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  • 16
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.