INFLUENCE OF APPARATUS GEOMETRY AND DEPOSITION CONDITIONS ON THE STRUCTURE AND TOPOGRAPHY OF THICK SPUTTERED COATINGS.

J Vac Sci Technol

Volumn 11, Issue 4, 1974, Pages 666-670

  Thornton, John A ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

SPUTTERING;

FILMS;

EID: 0016083153     PISSN: None     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1312732     Document Type: Conference Paper

References (30)