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Volumn 20, Issue 6, 1973, Pages 659-665

Subthreshold Characteristics of Insulated-Gate Field-Effect Transistors

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICES, MIS - MODELING;

EID: 0015681365     PISSN: 00189324     EISSN: None     Source Type: Journal    
DOI: 10.1109/TCT.1973.1083759     Document Type: Article
Times cited : (49)

References (16)
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    • (1969) Solid-State Electron. , vol.12 , pp. 305-336
    • Das, M.B.1
  • 5
    • 0040783400 scopus 로고
    • n-type surface conductivity on p-type germanium
    • W.L. Brown, “n-type surface conductivity on p-type germanium,” Phys. Rev., vol. 91, no. 3, pp. 518–527, 1953.
    • (1953) Phys. Rev. , vol.91 , Issue.3 , pp. 518-527
    • Brown, W.L.1
  • 6
    • 49949128094 scopus 로고
    • Theoretical threshold voltages for MOS field effect transistors
    • P. Richman, “Theoretical threshold voltages for MOS field effect transistors,” Solid-State Electron., vol. 11, pp. 869–876, 1968.
    • (1968) Solid-State Electron. , vol.11 , pp. 869-876
    • Richman, P.1
  • 7
    • 84889387634 scopus 로고
    • Technology and performance of integrated complementary MOS circuits
    • June
    • T. Klein, “Technology and performance of integrated complementary MOS circuits,” IEEE J. Solid-State Circuits, vol. SC-4, pp. 122–130, June 1969.
    • (1969) IEEE J. Solid-State Circuits , vol.4 SC , pp. 122-130
    • Klein, T.1
  • 8
    • 0015300231 scopus 로고
    • Subthreshold drain leakage currents in MOS field-effect transistors
    • Feb.
    • W.M. Gosney, “Subthreshold drain leakage currents in MOS field-effect transistors,” IEEE Trans. Electron Devices, vol. ED-19, pp. 213–219, Feb. 1972.
    • (1972) IEEE Trans. Electron Devices , vol.19 ED , pp. 213-219
    • Gosney, W.M.1
  • 9
    • 0015493756 scopus 로고
    • Leakage currents of MOS devices under surface depletion conditions
    • May
    • R.A. Stuart and W. Eccleston, “Leakage currents of MOS devices under surface depletion conditions,” Electron. Lett., vol. 8, pp. 225–227, May 1972.
    • (1972) Electron. Lett. , vol.8 , pp. 225-227
    • Stuart, R.A.1    Eccleston, W.2
  • 10
    • 0000247245 scopus 로고
    • Low level currents in insulated gate field effect transistors
    • Mar.
    • M.B. Barron, “Low level currents in insulated gate field effect transistors,” Solid-State Electron., vol. 15, pp. 293–302, Mar. 1972.
    • (1972) Solid-State Electron. , vol.15 , pp. 293-302
    • Barron, M.B.1
  • 11
    • 0015330654 scopus 로고
    • Ion-implanted complementary MOS transistors in low-voltage circuits
    • Apr.
    • R.M. Swanson and J.D. Meindl, “Ion-implanted complementary MOS transistors in low-voltage circuits,” IEEE J. Solid-State Circuits, vol. SC-7, pp. 146–153, Apr. 1972.
    • (1972) IEEE J. Solid-State Circuits , vol.7 SC , pp. 146-153
    • Swanson, R.M.1    Meindl, J.D.2
  • 12
    • 49949134400 scopus 로고
    • Effects of diffusion current on characteristics of metal-oxide (insulator)-semiconductor transistors
    • H.C. Pao and C.T. Sah, “Effects of diffusion current on characteristics of metal-oxide (insulator)-semiconductor transistors,” Solid-State Electron., vol. 9, pp. 927–937, 1966.
    • (1966) Solid-State Electron. , vol.9 , pp. 927-937
    • Pao, H.C.1    Sah, C.T.2
  • 14
    • 49649158237 scopus 로고
    • The distribution of mobile carriers in the pinch-off region of an insulated-gate field-effect transistor and its effect on device breakdown
    • G.A. Armstrong and J.A. Magowan, “The distribution of mobile carriers in the pinch-off region of an insulated-gate field-effect transistor and its effect on device breakdown,” Solid-State Electron., vol. 14, pp. 723–733, 1971.
    • (1971) Solid-State Electron. , vol.14 , pp. 723-733
    • Armstrong, G.A.1    Magowan, J.A.2
  • 15
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    • Mathematical simulation of the effects of ionizing radiation on semiconductors
    • USAF Cambridge Res. Labs., Bedford, Mass., AFCRL-71-0272, Sci. Rep. 1, also, D.P. Kennedy and P.C. Murley, “Steady state mathematical theory for the insulated gate field effect transistor,” IBM J. Res. Develop., vol. 17, pp. 2–12, 1973.
    • D.P. Kennedy, “Mathematical simulation of the effects of ionizing radiation on semiconductors,” USAF Cambridge Res. Labs., Bedford, Mass., AFCRL-71-0272, Sci. Rep. 1, 1971;also, D.P. Kennedy and P.C. Murley, “Steady state mathematical theory for the insulated gate field effect transistor,” IBM J. Res. Develop., vol. 17, pp. 2–12, 1973.
    • (1971)
    • Kennedy, D.P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.