High Resolution Deep UV Laser Mask Repair Based on Near-Field Optical Technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2793, Issue , 1996, Pages 481-488

  Lieberman, K ^a   Terkel, H ^a   Rudman, M ^a   Ignatov, A ^a   Lewis, A ^b  

^a Nanonics Lithography Ltd   (Israel)

^b HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; HIGH ENERGY LASERS; IMAGE RECONSTRUCTION; LASER BEAMS; MASKS; OPTICAL INSTRUMENTS; QUARTZ; REPAIR; X RAYS;

DEEP-UV LASERS; DIRECT ABLATION; HIGH RESOLUTION; OPAQUE DEFECTS; OPTICAL TECHNOLOGY; PHASE-SHIFT MASK; QUARTZ SUBSTRATE; ULTRAHIGH RESOLUTION;

PHOTOMASKS;

EID: 0013607341     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.245238     Document Type: Conference Paper

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