Effects of in situ doping from B2H6 and PH3 on hydrogen desorption and the low-temperature growth mode of Si on Si(100) by remote plasma enhanced chemical vapor deposition

Applied Physics Letters

Volumn 70, Issue 21, 1997, Pages 2819-2821

  Doris, B ^a   Fretwell, J ^b   Erskine, J L ^a   Banerjee, S K ^b  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013377824     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119207     Document Type: Article

References (9)

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