Real time spectroellipsometry for optimization of diamond film growth by microwave plasma-enhanced chemical vapor deposition from CO/H2 mixtures

Journal of Applied Physics

Volumn 80, Issue 11, 1996, Pages 6489-6495

  Lee, Joungchel ^a,b   Hong, Byungyou ^a   Messier, R ^a,b   Collins, R W ^a,b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b Department of Physics ^*

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013377613     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363668     Document Type: Article

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