Process induced deep-level defects in high purity silicon

Semiconductor Science and Technology

Volumn 13, Issue 5, 1998, Pages 488-495

  Astrova, E V ^a   Voronkov, V B ^a   Kozlov, V A ^a   Lebedev, A A ^a  

^a IOFFE INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013348242     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/13/5/008     Document Type: Article

References (16)

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