Polarization reversal in congruent and stoichiometric lithium tantalate

Applied Physics Letters

Volumn 79, Issue 19, 2001, Pages 3146-3148

  Shur, V Ya ^a   Nikolaeva, E V ^a   Shishkin, E I ^a   Kozhevnikov, V L ^a   Chernykh, A P ^a   Terabe, K ^b   Kitamura, K ^b  

^a URAL FEDERAL UNIVERSITY   (Russian Federation)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013245812     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1416471     Document Type: Article

References (23)

1. R. Byer, J. Nonlinear Opt. Phys. & Mater. 6, 549 (1997).
2. G. Rosenman, A. Skliar, and A. Arie, Ferroelectr. Rev. 1, 263 (1999).
3. M. Yamada, M. Saitoh, and H. Ooki, Appl. Phys. Lett. 69, 3659 (1996).
4. R. Batchko, V. Shur, M. Fejer, and R. Byer, Appl. Phys. Lett. 75, 1673 (1999).
5. K. Kitamura, Y. Furukawa, K. Niwa, V. Gopalan, and T. Mitchell, Appl. Phys. Lett. 73, 3073 (1998).
6. V. Gopalan and T. Mitchell, J. Appl. Phys. 85, 2304 (1999).
7. Y. Furukawa, K. Kitamura, E. Suzuki, and K. Niwa, J. Cryst. Growth 197, 889 (1999).
8. V. Shur, E. Rumyantsev, and S. Makarov, J. Appl. Phys. 84, 445 (1998).
9. V. Shur, E. Rumyanstev, E. Nikolaeva, E. Shiskin, D. Fursov, R. Batchko, L. Eyres, M. Fejer, R. Byer, and J. Sindel, Ferroelectrics 253, 105 (2001).
10. V. Shur, E. Rumyantsev, E. Nikolaeva, E. Shishkin, D. Fursov, R. Batchko, L. Eyres, M. Fejer, and R. Byer, Appl. Phys. Lett. 76, 143 (2000).
11. V. Shur, E. Rumyantsev, E. Nikolaeva, and E. Shishkin, Appl. Phys. Lett. 77, 3636 (2000).
12. L. Myers, Ph.D. thesis, Stanford University, 1995.
13. J. Russ, Fractal Surfaces (Plenum, New York, 1994), p. 112.
14. J. Feder, Fractals (Plenum, New York, 1988), p. 181.
15. A. Hasmy, M. Foret, J. Pelous, and R. Jullien, Phys. Rev. B 48, 9345 (1993).
16. M. Drougard and R. Landauer, J. Appl. Phys. 30, 1663 (1959).
17. V. Shur, E. Rumyantsev, V. Kuminov, A. Subbotin, and E. Nikolaeva, Phys. Solid State 41, 112 (1999).
18. V. Y. Shur, in Ferroelectric Thin Films: Synthesis and Basic Properties (Gordon and Breach, New York, 1996), Chap. 6.
19. B. Alessandro, C. Beatrice, G. Bertotti, and A. Montorsi, J. Appl. Phys. 68, 2908 (1990).
20. V. Fridkin, Ferroelectrics Semiconductors (Consultants Bureau, New York, 1980).
21. U. Robels and G. Arlt, J. Appl. Phys. 73, 3454 (1993).
22. P. Lambeck and G. Jonker, J. Phys. Chem. Solids 47, 453 (1986).
23. I. Stolichnov, A. Tagantsev, N. Setter, J. Cross, and M. Tsukada, Appl. Phys. Lett. 74, 3552 (1999).