GaCl molecular beam cell for surface dynamics studies

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1602-1605

  Ohashi, Masafumi ^a   Ozeki, Masashi ^a  

^a JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013114627     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581858     Document Type: Article

References (10)

1. N. Pütz, E. Veuhoff, K.-H. Bachem, P. Balk, and H. Lüth, J. Electrochem. Soc. 128, 2202 (1981).
2. K. Grüter, M. Deshler, H. Jürgensen, R. Beccard, and P. Balk, J. Cryst. Growth 94, 607 (1989).
3. N. Takahashi, M. Yagi, A. Koukitsu, and H. Seki, Jpn. J. Appl. Phys., Part 2 32, L1277 (1993).
4. A. Usui and H. Sunakawa, Jpn. J. Appl. Phys., Part 2 25, L212 (1986).
5. Y. Mochizuki, T. Takata, and A. Usui, Jpn. J. Appl. Phys., Part 2 32, L197 (1993).
6. C. Sasaoka, Y. Kato, and A. Usui, J. Cryst. Growth 115, 94 (1991).
7. M. Ozeki, Mater. Sci. Rep. 8, 97 (1992).
8. D. J. Kirwan, J. Electrochem. Soc. 117, 1572 (1970).
9. R. R. Fergusson and T. Gabor, J. Electrochem. Soc. 111, 585 (1964).
10. H. Ashkenas and F. S. Sherman, 4th Rarefied Gas Dynamics (Academic Press, New York, 1964), Vol. 2, p. 84.