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Materials Science and Engineering B

Volumn 39, Issue 3, 1996, Pages 224-227

Reflow of BeF2-B2O3-GeO2-SiO2 glasses and application of their membranes to metal-oxide-silicon (MOS) capacitors

(2) Kobayashi, Keiji a Mizushima, Ichiro a

a TOSHIBA CORPORATION (Japan)

Author keywords

Glass; Metal oxide silicon capacitors

Indexed keywords

ABSORPTION; CAPACITORS; CURRENT VOLTAGE CHARACTERISTICS; FLUORINE COMPOUNDS; HYSTERESIS; MEMBRANES; MOS DEVICES; PASSIVATION; VISCOUS FLOW; WATER;

ABSORPTION COEFFICIENT; CAPACITANCE VOLTAGE CHARACTERISTICS; HANNAY EQUATION; HYSTERESIS LOOP; IONIC BONDS; METAL OXIDE SILICON CAPACITORS;

SEMICONDUCTING GLASS;

EID: 0013111768 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/0921-5107(96)01554-1 Document Type: Article

Times cited : (4)

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