Field dependent resonance frequency of hysteresis loops in a few monolayer thick Co/Cu(001) films

Journal of Applied Physics

Volumn 79, Issue 8 PART 2A, 1996, Pages 5122-5124

  Jiang, Q ^a   Yang, H N ^a   Wang, G C ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013100664     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361549     Document Type: Article

References (24)

1. M. Rao, H. R. Krishnamurthy, and R. Pandit, Phys. Rev. B 42, 856 (1990).
2. C. N. Luse and A. Zangwill, Phys. Rev. E 50, 224 (1993).
3. P. Jung, G. Greg, R. Roy, and P. Mandel, Phys. Rev. Lett. 65, 1873 (1990).
4. D. Dhar and P. Thomas, J. Phys. A 25, 4967 (1992).
5. A. M. Somoza and R. C. Desai, Phys. Rev. Lett. 70, 3279 (1993).
6. Y.-L. He and G.-C. Wang, Phys. Rev. Lett. 70, 2336 (1993).
7. Q. Jiang, H.-N. Yang, and G.-C. Wang, Phys. Rev. B 52, 14911 (1995).
8. Y.-L. He and G.-C. Wang, J. Appl. Phys. 76, 6446 (1994).
9. S. Z. Wu, G. J. Mankey, F. Huang, and R. F. Willis, J. Appl. Phys. 76, 6434 (1994).
10. M. Donath, G. Schönhense, K. Ertl, and V. Dose, Appl. Phys. A 50, 49 (1990); R. Allenspach, M. Taborelli, M. Landolt, and H. C. Siegmann, Phys. Rev. Lett. 56, 953 (1986).
11. M. Donath, G. Schönhense, K. Ertl, and V. Dose, Appl. Phys. A 50, 49 (1990); R. Allenspach, M. Taborelli, M. Landolt, and H. C. Siegmann, Phys. Rev. Lett. 56, 953 (1986).
12. S. U. Jen and C. J. Weng, J. Appl. Phys. 64, 4627 (1988).
13. K. Shirae, J. Appl. Phys. 50, 7618 (1979).
14. J. J. Lu, H. L. Huang, and I. Klik, J. Appl. Phys. 76, 1726 (1994).
15. H. B. Jiang and C. P. Bean, Rev. Sci. Instrum. 66, 3284 (1995).
16. J. Pommier, P. Meyer, G. Pénissard, J. Ferré, P. Bruno, and D. Renard, Phys. Rev. Lett. 65, 2054 (1990).
17. U. Scheithauer, G. Meyer, and M. Henzler, Surf. Sci. 178, 441 (1986); J.-K. Zuo, R. A. Harper, and G.-C. Wang, Appl. Phys. Lett. 51, 250 (1987).
18. U. Scheithauer, G. Meyer, and M. Henzler, Surf. Sci. 178, 441 (1986); J.-K. Zuo, R. A. Harper, and G.-C. Wang, Appl. Phys. Lett. 51, 250 (1987).
19. J.-P. Qian and G.-C. Wang, J. Vac. Sci. Technol. A 8, 4117 (1990).
20. Q. Jiang, H.-N. Yang, and G.-C. Wang (unpublished).
21. B. D. Cullity, Introduction to Magnetic Materials (Addison-Wesley, Reading, MA, 1972).
22. W. D. Doyle, L. He, and P. J. Flanders, IEEE Trans. Magn. 29, 3634 (1993).
23. H.-N. Yang, G.-C. Wang, and T.-M. Lu, Diffraction From Rough Surfaces and Dynamic Growth Fronts (World Scientific, Singapore, 1993).
24. A. Zangwill, these proceedings.