Thermal stability of uniform silver clusters prepared on oxidized silicon and aluminum surfaces by electron beam lithography in oxidizing and reducing ambients

Catalysis Letters

Volumn 45, Issue 1-2, 1997, Pages 5-13

  Yang, Michael X ^a   Jacobs, Peter W ^a,b   Yoon, Cheonho ^a,b,c   Muray, Lawrence ^a   Anderson, Erik ^a   Attwood, David ^a   Somorjai, Gabor A ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c Myong Ji University   (South Korea)

Author keywords

Catalyst stability; Cluster; Electron beam lithography; Silver

Indexed keywords

EID: 0013007438     PISSN: 1011372X     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1019090823171     Document Type: Article

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