Effect of the stiffness of the measurement system on adhesion force curves in the elastic continuum limit

Journal of Adhesion Science and Technology

Volumn 10, Issue 1, 1996, Pages 17-31

  Takahashi, Kunio ^a   Onzawa, Tadao ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Adhesion; Atomic force microscope; Compliance; Continuum theory; DMT; Elastic contact; Force curve; Hysteresis; JKR; MYD; Stiffness

Indexed keywords

ATOMIC FORCE MICROSCOPES; COMPLIANCE; CONTINUUM THEORY; DMT; ELASTIC CONTACT; FORCE CURVE; JKR; MYD;

ADHESION; ATOMIC FORCE MICROSCOPY; CONTINUUM MECHANICS; HYSTERESIS; LENNARD-JONES POTENTIAL; MEASUREMENTS; PRESSURE DISTRIBUTION; SURFACE CHEMISTRY;

STIFFNESS;

EID: 0012959582     PISSN: 01694243     EISSN: 15685616     Source Type: Journal    
DOI: 10.1163/156856196X00427     Document Type: Article

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