The first phase to nucleate in planar transition metal-germanium interfaces

Thin Solid Films

Volumn 42, Issue 1, 1977, Pages 51-59

  Wittmer, M ^a   Nicolet, M A ^a   Mayer, J W ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012931985     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(77)90077-3     Document Type: Article

References (23)

1. Epitaxial Growth of Nickel Silicide NiSi2on Silicon
2. The Crystal Structure of Rh3Si4.
3. The Crystal Structure of Rh4Si5 and its Relation to Other Members of the MnP Structure Family.
4. Least-squares Refinement of the Structure of RhSi (FeSi-type).