Preparation of Iridium Films by MOCVD and Their Application for Oxygen Gas Sensors

Inorganic Materials

Volumn 33, Issue 10, 1997, Pages 1017-1021

  Goto, T ^a   Ono, T ^a   Hirai, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012824279     PISSN: 00201685     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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3. Hirai, T. and Goto, T., Synthesis of Ceramics by Thermal CVD, New Ceram., 1988, no. 3, pp. 58-64.
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5. Vargas, R., Goto, T., Zhang, W., and Hirai, T., Epitaxial Growth of Iridium and Platinum Films on Sapphire by Metalorganic Chemical Vapor Deposition, Appl. Phys. Lett., 1994, vol. 65, no. 9, pp. 1094-1096.
6. Xue, Z., Strouse, M.J., Shuh, D.K., Knobler, C.B., Kaesz, H.D., Hicks, R.F., and Williams, R.S., Characterization of (Methylcyclopentadienyl)trimethylplatinum and Low-Temperature Organometallic Chemical Vapor Deposition of Platinum Metal, J. Am. Chem. Soc., 1989, vol. 111, no. 24, pp. 8779-8784.
7. 3,Appl. Phys. Lett., 1988, vol. 53, no. 18, pp. 1705-1707.
8. Goto, T., Vargas, R., and Hirai, T., Preparation of Iridium and Platinum Films by MOCVD and Their Properties, J. Phys. C: Solid State Phys., 1993, vol. 3, pp. 297-304.
9. Irvine, J.T.S., Sinclair, D.C., and West, A.R., Electroceramics: Characterization by Impedance Spectroscopy, Adv. Mater., 1990, vol. 2, no. 3, pp. 132-138.
10. Bauerle, J.E., Study of Solid Electrolyte Polarization by a Complex Admittance Method, J. Phys. Chem. Solids, 1969, vol. 30, no. 12, pp. 2657-2670.
11. Badwalle, S.P.S. and de Bruin, H.J., Electrode Kinetics at the Pt/Yttria-stabilized Zirconia Interface by Complex Impedance Dispersion Analysis, Phys. Status Solidi A, 1979, vol. 54, no. 1, pp. 261-270.
12. Heyne, L., Solid Electrolytes, Geller, S., Ed., Berlin: Springer, 1977, pp. 169-221.