Effect of plasma polymerization film on reducing damage of reactive ion etched silicon substrates with CHF3+O2 plasmas

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 1, 1997, Pages 66-69

  Kimizuka, Masakatsu ^a   Ozaki, Yoshiharu ^a   Watanabe, Yoshio ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012784884     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589257     Document Type: Article

References (14)

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