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Volumn 69, Issue 20, 1996, Pages 3051-3053

Interface-state density at SiO2/GaAs assessed by direct measurement of surface band bending

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0012784786     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116836     Document Type: Article
Times cited : (14)

References (19)
  • 15
    • 85033853845 scopus 로고    scopus 로고
    • note
    • +-layer dopings, this correction becomes slightly larger, which is anyhow quite easy to take into account as a further refinement to our method.
  • 18
    • 85033838475 scopus 로고    scopus 로고
    • note
    • A difference should be noted, however, in the CVD method employed in Ref. 17, which is a plasma-assisted one.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.