Measurement of dynamic/advancing/receding contact angle by video-enhanced sessile drop tensiometry

Review of Scientific Instruments

Volumn 67, Issue 8, 1996, Pages 2852-2858

  Lin, Shi Yow ^a   Chang, Hong Chi ^a   Lin, Lung Wei ^a   Huang, Pao Yao ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012749274     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1147117     Document Type: Article

References (18)

1. A. W. Adamson, Physical Chemistry of Surfaces (Wiley, New York, 1990), Chap. 10, p. 389.
2. FACE Contact Angle Meter, model CA-Z, Kyowa Interface Sci. Co., Tokyo, Japan.
3. Video Contact Angle System, model VCA 2000, Advanced Surface Tech. Inc., MA.
4. J. B. Cain, D. W. Francis, R. D. Venter, and A. W. Neumann, J. Colloid Interface Sci. 94, 123 (1983).
5. R. Y. Tsay, S. C. Yan, and S. Y. Lin, Rev. Sci. Instrum. 66, 5065 (1995).
6. Dynamic Contact Angle Analyzer, model DCA-322, CAHN Instruments, Inc., CA.
7. C. G. L. Furmidge, J. Colloid Sci. 17, 309 (1962).
8. E. B. Gutoff and C. E. Kendrick, AIChE J. 28, 459 (1982).
9. F. K. Skinner, Y. Rotenberg, and A. W. Neumann, J. Colloid Interface Sci. 130, 25 (1989).
10. E. Mooy, P. Cheng, Z. Policova, S. Treppo, D. Kwok, D. R. Mack, P. M. Sherman, and A. W. Neumann, Colloids Surf. 58, 215 (1991).
11. C. Huh and R. L. Reed, J. Colloid Interface Sci. 91, 472 (1983).
12. Y. Rotenberg, L. Boruvka, and A. W. Neumann, J. Colloid Interface Sci. 93, 169 (1983).
13. S. Y. Lin and H. F. Hwang, Langmuir 10, 4703 (1994).
14. S. Y. Lin, K. McKeigue, and C. Maldarelli, AIChE J. 36, 1785 (1990).
15. B. Carnahan, H. A. Luther, and J. O. Wilkes, Applied Numerical Methods (Wiley, New York, 1969).
16. S. Y. Lin, T. L. Lu, and W. B. Huang, Langmuir 11, 555 (1995).
17. S. Y. Lin, L. J. Chen, J. W. Xyu, and W. J. Wang, Langmuir 11, 4159 (1995).
18. C. A. Smith and A. B. Corripio, Principles and Practice of Automatic Process Control (Wiley, New York, 1985), Chap. 5, p. 165.