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Volumn 5, Issue 3-5, 1996, Pages 556-559

Formation and characterization of SiC-Si heterojunction by carbon implantation with a MEVVA ion source

(3)  Yan, H a   Kwok, R W M a   Wong, S P a  

a NONE

Author keywords

Carbon implantation; MEVVA ion source; SiC layer; SiC Si heterojunction

Indexed keywords


EID: 0012589579     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00411-4     Document Type: Article
Times cited : (14)

References (16)
  • 4
    • 0042861821 scopus 로고    scopus 로고
    • 7th Int. Conf. on solid films and surfaces, Hsinchu, Taiwan, Dec. 12-16, 1994
    • H. Yan, R.W.M. Kwok and S.P. Wong, 7th Int. Conf. on Solid Films and Surfaces, Hsinchu, Taiwan, Dec. 12-16, 1994, to be published in Appl. Surface Sci.
    • Appl. Surface Sci.
    • Yan, H.1    Kwok, R.W.M.2    Wong, S.P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.