High photorefractive sensitivity at 860 nm in reduced rhodium-doped KNbO3

Optics Letters

Volumn 22, Issue 11, 1997, Pages 781-783

  Ewart, M ^a   Ryf, R ^a   Medrano, C ^a   Wuest H ^a   Zgonik, M ^a   Gunter P ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012548030     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.22.000781     Document Type: Article

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