Evaluation of low cost residual gas analyzers for ultrahigh vacuum applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 1312-1318

  Rao, M G ^a   Dong, C ^a  

^a THOMAS JEFFERSON NATIONAL ACCELERATOR FACILITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPARISON METHODS; HELIUM LEAKS; ION CURRENTS; JEFFERSON LAB; LOW COSTS; MARKET PLACE; PERFORMANCE CHARACTERISTICS; PRESSURE RANGES; RELATIVE SENSITIVITY; RESIDUAL GAS; RESIDUAL GAS ANALYZERS; SPINNING ROTOR; TRANSFER STANDARD;

COMPUTER CONTROL SYSTEMS; GAGES; HELIUM; VACUUM; VACUUM DEPOSITION;

ION BEAMS;

EID: 0012489915     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580582     Document Type: Article

References (12)

1. M. G. Rao, J. Vac. Sci. Technol. A 11, 1598 (1993).
2. W. R. Balnchard, P. J. McCarthy, H. F. Dylla, P. H. LaMarche, and J. E. Simpkins, J. Vac. Sci. Technol. A 4, 1715 (1986).
3. P. H. Dawson, Quadrupole Mass Spectrometry and Its Applications (AIP Press, New York, 1995).
4. J. H. Batley, Vacuum 37, 659 (1987).
5. J. H. Leck, Total and Partial Pressure Measurement in Vacuum Systems (Blackie, Glasgow, 1987).
6. P. H. Dawson, J. Vac. Sci. Technol. A 4, 1709 (1986).
7. L. Lieszkovszky, A. R. Filippelli, and C. R. Tilford, J. Vac. Sci. Technol. A 8, 3838 (1990).
8. W. E. Austin, J. H. Leck, and J. H. Batey, J. Vac. Sci. Technol. A 10, 3563 (1992).
9. W. E. Austin, Fu Ming Mo, Jin Man Yang, and J. H. Leek, J. Vac. Sci. Technol. A 5, 2631 (1987).
10. J. A. Basford, M. D. Boeckmann, R. E. Elleson, A. R. Fillippelli, D. H. Holkeboer, L. Leiszkovszky, and C. M. Stupak, J. Vac. Sci. Technol. A 11, A22 (1993).
11. M. C. Cowen, W. Allison, and J. H. Batey, J. Vac. Sci. Technol. A 12, 228 (1994).
12. F. M. Mao and J. H. Leek, Vacuum 37, 675 (1987).