The effects of oxygen content in Ti/Si layer systems on MCs+ SIMS analysis

International Journal of Mass Spectrometry and Ion Processes

Volumn 164, Issue 1-2, 1997, Pages 155-159

  Dummler W ^a   Weber, S ^a   Tete C ^a   Scherrer, S ^a  

^a UNIVERSITÉ DE LORRAINE   (France)

Author keywords

Cs+ SIMS; Mass interferences; Oxygen leakage; Titanium layers

Indexed keywords

EID: 0012438908     PISSN: 01681176     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0168-1176(97)00054-2     Document Type: Article

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