Energy-mass spectrometry and automatic langmuir probe measurements in reactive ICP plasmas for diamond deposition

Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1020-1026

  Awakowicz, Peter ^a   Schwefel, Roland ^a   Werder, Manfred ^a   Kasper, Wolfgang ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Diamond deposition; Energy mass spectrometry; ICP; Langmuir probe

Indexed keywords

EID: 0012386916     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00228-4     Document Type: Article

References (5)

1. W. Kasper, P. Awakowicz, ISPC 12, Minneapolis (1995) pp. 2239-2244.
2. W. Kasper, P. Awakowicz, ISPC XXII, New Jersey (1995) p. 171.
3. M. Klick, W. Rehak, W. Kasper, P. Awakowicz, G. Franz, Surface and Coatings Technology 98 (1998).
4. Y.A. Mankelevich, A.T. Rakhimov, N.V. Suetin, S.V. Kostyuk, Diamond Relat. Mater. 5 (1996) 964-967.
5. S.P. Bozeman, D.A. Tucker, B.R. Stoner, J.T. Glass, W.M. Hooke, Appl. Phys. Lett. 66 (1995) 26.