Pseudo-interface formation and diffusion behaviour in the B2 phase region of NiAl-base diffusion couples

Defect and Diffusion Forum

Volumn 143-147, Issue , 1997, Pages 425-430

  Kainuma, R ^a   Ikenoya, H ^b   Ohnuma, I ^a   Ishida, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b MITSUBISHI MATERIALS CORPORATION   (Japan)

Author keywords

Diffusion Couple; NiAl Base Systems; Pseudo Interface; Thermodynamic Factor; Up Hill Diffusion

Indexed keywords

EID: 0012227768     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.143-147.425     Document Type: Article

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