메뉴 건너뛰기




Volumn 36, Issue 6, 1997, Pages 1139-1142

Measurement of the small-signal gain and saturation intensity of a XeF discharge laser

Author keywords

Lasers; Oscillator amplifiers; XeF excimer

Indexed keywords


EID: 0012166633     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.36.001139     Document Type: Article
Times cited : (19)

References (13)
  • 1
    • 5544245211 scopus 로고
    • Gain and fluorescence measurements in photoionization stabilized XeF discharge lasers operating at high-energy loadings
    • V. Hasson, C. M. Lee, R. Exberger, K. W. Billman, and P. D. Rowley, “Gain and fluorescence measurements in photoionization stabilized XeF discharge lasers operating at high-energy loadings, ” Appl. Phys. Lett. 31, 167-169 (1977).
    • (1977) Appl. Phys. Lett. , vol.31 , pp. 167-169
    • Hasson, V.1    Lee, C.M.2    Exberger, R.3    Billman, K.W.4    Rowley, P.D.5
  • 2
    • 0019059343 scopus 로고
    • Gain studies of electron beam excited XeF laser mixtures
    • W. E. Ernst and F. K. Tittel, “Gain studies of electron beam excited XeF laser mixtures, ” IEEE J. Quantum Electron. QE-16, 945-948 (1980).
    • (1980) IEEE J. Quantum Electron. QE-16 , pp. 945-948
    • Ernst, W.E.1    Tittel, F.K.2
  • 3
    • 0018915196 scopus 로고
    • Laser gain measurements by means of amplified spontaneous emission
    • G. Marowsky, F. K. Tittel, W. L. Wilson, andE. Frenkel, “Laser gain measurements by means of amplified spontaneous emission, ” Appl. Opt. 19, 138-143 (1980).
    • (1980) Appl. Opt. , vol.19 , pp. 138-143
    • Marowsky, G.1    Tittel, F.K.2    Wilson, W.L.3    Frenkel, E.4
  • 5
    • 0020289901 scopus 로고
    • Gain, saturation, and optimization of the XeF discharge laser
    • R. Sadighi-Bonabi, F. W. Lee, and C. B. Collins, “Gain, saturation, and optimization of the XeF discharge laser, ” J. Appl. Phys. 53, 8508-8514 (1982).
    • (1982) J. Appl. Phys. , vol.53 , pp. 8508-8514
    • Sadighi-Bonabi, R.1    Lee, F.W.2    Collins, C.B.3
  • 6
    • 5544223523 scopus 로고
    • Gain-dependent dispersion in a XeF laser
    • W. W. Chow and M. O. Scully, “Gain-dependent dispersion in a XeF laser, ” Opt. Lett. 7, 316-318 (1982).
    • (1982) Opt. Lett. , vol.7 , pp. 316-318
    • Chow, W.W.1    Scully, M.O.2
  • 10
    • 0023292231 scopus 로고
    • Jr., “Kinetically tailored properties of electron-beam excited XeF(C → A) and XeF(B → X) laser media using an Ar-Kr buffer mixture
    • W. L. Nighan, R. A. Sauerbrey, Y. Zhu, F. K. Tittel, and W. L. Wilson, Jr., “Kinetically tailored properties of electron-beam excited XeF(C → A) and XeF(B → X) laser media using an Ar-Kr buffer mixture, ” IEEE J. Quantum Electron. QE-23, 253-261 (1987).
    • (1987) IEEE J. Quantum Electron. QE-23 , pp. 253-261
    • Nighan, W.L.1    Sauerbrey, R.A.2    Zhu, Y.3    Tittel, F.K.4    Wilson, W.L.5
  • 12
  • 13
    • 0021375517 scopus 로고
    • Amplification characteristics of a N2+ ion laser
    • + ion laser, ” J. Phys. D 17, 239-246 (1984).
    • (1984) J. Phys. D , vol.17 , pp. 239-246
    • Kokawa, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.