Damage-depth profiling of ion-irradiated polyimide films with a variable-energy positron beam

Journal of Polymer Science, Part B: Polymer Physics

Volumn 38, Issue 23, 2000, Pages 3062-3069

  Dlubek, G ^a   Borner F ^b   Buchhold, R ^c   Sahre, K ^d   Krause Rehberg, R ^b   Eichhorn, K J ^d  

^a ITA Institut fur innovative Technologien GmbH   (Germany)

^b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^c DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^d LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CHEMICAL MODIFICATION; ELLIPSOMETRY; INTERFEROMETRY; ION BOMBARDMENT; POSITRONS; SILICON; SUBSTRATES; THIN FILMS;

DAMAGE DEPTH PROFILES; SPIN COATING;

POLYIMIDES;

EID: 0012100367     PISSN: 08876266     EISSN: None     Source Type: Journal    
DOI: 10.1002/1099-0488(20001201)38:23<3062::AID-POLB80>3.0.CO;2-I     Document Type: Article

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