Production of very low energy and high brightness ion beam

Review of Scientific Instruments

Volumn 67, Issue 3, 1996, Pages 1393-1395

  Yoshikawa, Takafumi ^a   Nakamura, Shin ^a   Ueda, Yoshio ^a   Goto, Seiichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

BEAM EMITTANCE; BEAM PRODUCTION; CURRENT DENSITY; ELECTRIC DISCHARGES; EV RANGE; ION BEAMS; PLASMA POTENTIAL; PLASMA RADIAL PROFILES; PLASMA SHEATH

Indexed keywords

EID: 0012091202     PISSN: 00346748     EISSN: 10897623     Source Type: Journal    
DOI: 10.1063/1.1146679     Document Type: Conference Paper

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