An IR analysis of the role of SiO4 tetrahedra in thermally annealed ZrSiO4

Neues Jahrbuch fur Mineralogie, Monatshefte

Volumn 3, Issue , 1999, Pages 113-122

  Colombo, M ^a   Chrosch, J ^a,b   Biagini, R ^c   Memmi, I ^c  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF SIENA   (Italy)

Author keywords

Annealing; Infra red; Radiation damage; SiO2; X ray diffraction; Zircon

Indexed keywords

EID: 0011581966     PISSN: 00283649     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (25)

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