Dewar benzene as a protecting group? demonstration of photolithographic crystallization

Organic Letters

Volumn 3, Issue 24, 2001, Pages 3847-3849

  Marsella, Michael J ^a   Meyer, Mathew M ^a   Tham, Fook S ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

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ARTICLE;

EID: 0011577564     PISSN: 15237060     EISSN: None     Source Type: Journal    
DOI: 10.1021/ol0166810     Document Type: Article

References (12)

1. Green, T. W. Protective Groups in Organic Synthesis; Wiley: New York, 1980.
2. Wuts, P. G. M.; Green, T. W. Protective Groups in Organic Synthesis; Wiley: New York, 1991; Vol. 2.
3. Desiraju, G. R. Crystal Engineering. The Design of Organic Solids; Elsevier: New York, 1989; Vol. 54.
4. Desiraju, G. R. Angew. Chem., Int. Ed. Engl. 1995, 34, 2311-2327.
5. Trost, B. M. Science 1991, 254, 1471.
6. Koster, J. B.; Timmermans, G. J.; van Bekkum, H. Synthesis 1971, 139-140.
7. Calculations reported herein were performed using Titan software, Schrödinger, Inc., 1500 SW First Avenue, Suite 1180, Portland, OR 97201.
8. Desiraju, G. R.; Gavezzottí, A. J. Chem. Soc., Chem. Commun. 1989, 621-623.
9. Characterization of compounds land 2 are consistent with literature values. Compound 1: see ref 6. Compound 2, see: McAlister, D. R.; Bercaw, J. E.; Bergman, R. G. J. Am. Chem. Soc. 1977, 99, 1666-1668.
10. Gleiter, R.; Treptow, B. J. Org. Chem. 1993, 58, 7740-7750.
11. Gleiter, R.; Ohlbach, F.; Oeser, T.; Irngartinger, H. Liebigs Ann. 1996, 785-790.
12. Crystallographic data has been deposited in the Cambridge Crystallographic Data Centre Database.