Instruction via web-based semiconductor simulation tools: The case of "fundamentals and design of microelectronics processing"

Chemical Engineering Education

Volumn 32, Issue 4, 1998, Pages 242-245

  Dang, Sanjit Singh ^a   Takoudis, Christos G ^a  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011489204     PISSN: 00092479     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (14)

1. Lee, H.H., Fundamentals of Microelectronics Processing, McGraw-Hill, New York, NY (1990)
2. Middleman, S., and A.K. Hochberg, Process Engineering Analysis in Semiconductor Device Fabrication, McGraw-Hill, New York, NY (1993)
3. Ruska, S.W., Microelectronic Processing, McGraw-Hill, New York, NY (1987)
4. Wolf, S., and R.N. Tauber, Silicon Processing for the VLSI Era. Vol.1, Process Technology, Lattice Press (1986)
5. Sze, S.M., VLSI Technology, McGraw-Hill, New York (1988)
6. Ghandi, S.K., VLSI Fabrication Principles, Wiley Interscience (1990)
7. Campbell, S.A., The Science and Engineering of Microelectronic Fabrication, Oxford University Press (1996)
8. Madou, M., Fundamentals of Microfabrication, CRC Press (1997)
9. Kovacs, G.T.A., Micromachined Transducers Sourcebook, McGraw-Hill, New York, NY (1998)
10. Special section on Electronic Materials Processing, Chem. Eng. Ed., 24, 26 (1990)
11. For example: (a) Gordon, S., and B.J. McBride, Tech. Rpt. SP-273, NASA, NASA Lewis Research Center (1971); (b) Gaynor, W.H., "Applicability of Thermodynamic Calculations on the Prediction of Chemical Vapor Deposition Reactor Performance and Process-Property Relationships," BS Thesis, School of Chemical Engineering, Purdue University (1989); (c) I.M. Lee, A. Jansons, and C.G. Takoudis, "Effects of Water Vapor and Chlorine on the Epitaxial Growth of SiGe Films by Chemical Vapor Deposition; Thermodynamic Analysis," J. Vac. Sci. Tech., B 15, 880 (1997) and references therein
12. For example: (a) Gordon, S., and B.J. McBride, Tech. Rpt. SP-273, NASA, NASA Lewis Research Center (1971); (b) Gaynor, W.H., "Applicability of Thermodynamic Calculations on the Prediction of Chemical Vapor Deposition Reactor Performance and Process-Property Relationships," BS Thesis, School of Chemical Engineering, Purdue University (1989); (c) I.M. Lee, A. Jansons, and C.G. Takoudis, "Effects of Water Vapor and Chlorine on the Epitaxial Growth of SiGe Films by Chemical Vapor Deposition; Thermodynamic Analysis," J. Vac. Sci. Tech., B 15, 880 (1997) and references therein
13. For example: (a) Gordon, S., and B.J. McBride, Tech. Rpt. SP-273, NASA, NASA Lewis Research Center (1971); (b) Gaynor, W.H., "Applicability of Thermodynamic Calculations on the Prediction of Chemical Vapor Deposition Reactor Performance and Process-Property Relationships," BS Thesis, School of Chemical Engineering, Purdue University (1989); (c) I.M. Lee, A. Jansons, and C.G. Takoudis, "Effects of Water Vapor and Chlorine on the Epitaxial Growth of SiGe Films by Chemical Vapor Deposition; Thermodynamic Analysis," J. Vac. Sci. Tech., B 15, 880 (1997) and references therein
14. TSuprem-4: User's Manual, Version 6.4, Technology Modeling Associates, Inc., Sunnyvale, CA, October (1996)