Self-ion sputtering yields for copper, nickel, and aluminum

Nuclear Instruments and Methods

Volumn 194, Issue 1-3, 1982, Pages 615-619

  Allas, R G ^a   Knudson, A R ^a   Lambert, J M ^b   Treado, P A ^b   Reynolds, G W ^c  

^a NAVAL RESEARCH LABORATORY   (United States)

^b GEORGETOWN UNIVERSITY   (United States)

^c STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011460438     PISSN: 0029554X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0029-554X(82)90592-4     Document Type: Article

References (7)

1. Sputtering observations during binary alloy production by ion implantation
2. Sputtering experiments in the high energy region
3. Study of the sputtering process with Rutherford backscattering