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Volumn 11, Issue 3, 1998, Pages 5-11

X-ray scattering studies of the passive oxide film formed on iron

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EID: 0011342382     PISSN: 08940886     EISSN: 19317344     Source Type: Journal    
DOI: 10.1080/08940889808260927     Document Type: Article
Times cited : (3)

References (29)
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    • Uhlig, H.H.1
  • 9
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    • (1983) Passivity of Metals and Semiconductors , pp. 147
    • Hoffman, R.W.1
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    • (1994) Synchrotron Techniques in Interfacial Electrochemistry , pp. 109
    • Toney, M.F.1
  • 21
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    • New York: Interscience Publishers
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  • 27
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    • our initial experiments at +0.4 V, the potential was held for several hours before taking data and thus, we did not observe a time-dependence to the diffracted intensity. More recent experiments designed to look at time dependence at this potential showed that after the first four hours the diffraction peaks are, nearly saturated. Thus, time dependence did not influence the data described the previous section
    • In our initial experiments at +0.4 V, the potential was held for several hours before taking data and thus, we did not observe a time-dependence to the diffracted intensity. More recent experiments designed to look at time dependence at this potential showed that after the first four hours the diffraction peaks are, nearly saturated. Thus, time dependence did not influence the data described in the previous section


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