Electrical comparison of a parallel beam and batch implanters

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 376-379

  Jasper, Craig ^a   Dahl, Phil ^a   Yang, Ying Ying ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANALOG TECHNOLOGY; BEAM PARALLELISM; ELECTRICAL PARAMETER; NMOS DEVICES; PARALLEL BEAMS; STACKED TRANSISTORS; STATISTICAL DIFFERENCES; STATISTICAL SIGNIFICANCE; TILT ANGLE; TRANSISTOR MISMATCH;

MOS DEVICES; ROTATION; THRESHOLD VOLTAGE; VOLTAGE CONTROL; VOLTAGE REGULATORS;

ION IMPLANTATION;

EID: 0011308718     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924166     Document Type: Conference Paper

References (6)

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4. C. Gill, et al., Asia-Pacific Microwave Proceedings, Vol. 1, 1996.
5. M. Kaneshiro et al., High Performance VLSI Applications, 1996.
6. D.Lamey et al., Proceedings of the SPIE, Vol. 3506, September, 1998.