Plasma-enhanced chemical vapor deposition and structural characterization of amorphous chalcogenide films

Semiconductors

Volumn 32, Issue 8, 1998, Pages 855-860

  Nagels, P ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011156485     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1187472     Document Type: Article

References (11)

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