Photoresist application for the LIGA process

Microsystem Technologies

Volumn 4, Issue 4, 1998, Pages 159-162

  Chaudhuri, B ^a   Guckel, H ^b   Klein, J ^b   Fischer, K ^b  

^a Material Science Program

^b University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011029368     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050121     Document Type: Article

References (3)

1. Becker EW; Ehrfeld W; Hagmann P; Maner A; Milnchmeyer D: (1986) Fabrication of Microstructures with High Aspect Ratios and Great Structural Heights by Synchrotron Radiation Lithography, Galvanoforming, and Plastic Moulding (LIGA process). Microelectronic Engineering. 4: 35-56
2. Guckel H; Skrobis KJ; Klein J; Christensen TR; Wiegele T: (15-21 August, 1993) Deep X-ray Lithography for Micromechanics. Proceedings of the SPIE's International Symposium on Holography, Microstructures and Laser Technologies, Quebec City, Quebec. 290-297
3. Guckel H; Christensen TR; Skrobis KJ: (January 3, 1995) Formation of Microstructures using a Preformed Photoresist Sheet. US Patent # 5378583