Synthesis of coatings with hardness exceeding 40 GPa by iviagnetron sputtering

Journal of Tribology

Volumn 120, Issue 2, 1998, Pages 179-183

  Wu, Mei Ung ^a   Yang, Zunde ^a   Chung, Yip Wah ^a   Wong, Ming Show ^b   Sproul, William D ^b  

^a Northwestern University   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010931804     PISSN: 07424787     EISSN: 15288897     Source Type: Journal    
DOI: 10.1115/1.2834406     Document Type: Article

References (22)

1. Davis, L. E., MacDonald, N. C., Palmberg, P. W., Riach, G. E., and Weber, R, E., 1978, Handbook of Auger Electron Spectroscopy, Physical Electronics Industries, Eden Praire, MN.
2. 2 (N) Thin Films,” Surface and Coatings Technology, Vol. 76/77, pp. 609-614.
3. 2,” Surface and Coatings Technology, Vol. 45, pp. 105-113.
4. 2 and Ti(B, N) Coatings,” Mater. Sci. Eng. A., Vol. 140, pp. 616-624.
5. Ktiotek, O., 1990, “Superhard Ti-B-C-N Coatings,” Surface and Coatings Technology, Vol. 43/44, pp. 107-115.
6. Li, D., Chung, Y. W., Wong, M. S., and Sproui, W. D., 1993, “Nanoindentation Studies of Ultrahigh Strength Carbon Nitride Thin Films,” J. Appi Phys., Vol. 74, pp. 219-223.
7. Li, D., Lin, X., Dravid, V. P., Chung, Y. W., Chen, M. Y., Wong, M. S., and Sproui, W. D., 1994a, “Synthesis and Characterization of Super-Wear-Resistant Carbon Nitride Coatings,” Diamond films and Technol, Vol. 4, pp, 99-111.
8. Li, D., Chung, Y. W., Wong, M. S., and Sproui, W. D., 1994b, “Nanoindentation and Tribological Studies of Ultrahigh Strength Carbon Nitride thin Films,” Tribo. Transactions, Vol. 37, pp. 479-482.
9. Li, D., Cutiongco E., Chung Y. W., Wong, M. S., and Sproui, W. D., 1995a, “Review of Synthesis and Characterization of Amorphous Carbon Nitride Thin Films,” Diamond Films and Technol., Vol. 5, pp. 261-273.
10. Li, D., Chu, X., Cheng, S. C., Lin, X. W., Dravid, V. P., and Chung, Y. W., 1995b, “Synthesis of Superhard Carbon Nitride Composite Coatings,” Appi. Phys. Lett., Vol. 67, pp. 203-205.
11. Li, D., Chung, Y. W., Wong, M. S., and Sproui, W. D., 1995c, “Mechanical Properties of Amorphous Carbon Nitride Thin Films Prepared by Reactive Magnetron Sputtering,” Tribo. Lett., Vol. 1, pp. 87-93.
12. Li, D., Chu, X., Cheng, S. C., Lin, X. W., Dravid, V. P., and Chung, Y. W., 1996, “Structure and Hardness Studies of CNx/TiN Nanocomposite Coatings,” Appi. Phys. Lett., Vol. 68, pp. 1211-1213.
13. Liu, A. Y., and Cohen, M. L., 1989, “Predication of New Low Compressibility Solids,” Science, Vol. 245, pp. 841-842.
14. 4,” Physical Review B, Vol. 41, pp. 10727-10734.
15. Messier, R., Giri, A. P., and Roy, R. A., 1984, “Revised Structure Zone Model for Thin Film Physical Structure,” J. Vac. ScL Technol. A, Vol. 2, pp. 500-503.
16. Muller, K. H., 1985, “Dependence of Thin-film Microstructure on Deposition Rate by Means of a Computer Simulation,” J. Appi. Phys., Vol. 58 (7), pp. 2573-2576.
17. Oliver, W. C., and Pharr, G. M., 1992, “An improved Technique for Determining Hardness and Elastic Modulus Using Load and Displacement Sensing Indentation Experiments,” J. Mater. Res., Vol. 7, pp. 1564-1583.
18. Otter, F. A., Amisola, G. B., Roman, W. C., and Hay, S. O., 1992, “Properties of Plasma Assisted Chemical Vapor Deposited Coatings of Titanium Boride on Ti-6AI-4V Alloy Substrates,” J. Vac. Sci. Technol. A, Vol, 10(4), pp, 2796-2801.
19. Rossi, R., Andre, B., Veen, A., Mijnarends, P. E., Schut, H., Labohm, F., Dunlop, H., Delplancke, M. P., and Hubard, K., 1994, “Physical Properties of a-C:N Films Produced by Ion Beam Assisted Deposition,” J. Mater. Res., Vol. 9(9), pp. 2440-2449.
20. 2 Films by A Co-sputtering Method,” Thin Solid Films, Vol. 156, pp. 287-293.
21. Sproui, W. D., Rudnik, P. J., Graham, M. E., and Rohde, S. L., 1990, “High Rate Reaction Sputtering in an Opposed Cathode Closed-field Unbalanced Magnetron Sputtering System,” Surface and Coatings Technology, Vol. 43, pp. 270-278.
22. Xiong, F., Chang, R. P. H., and White, C. W., 1993, “Structure and Properties of a-C:N Films Prepared by Pulsed Excimer Laser Deposition,” MRS Symposium Proceeding, Vol. 280, pp. 587-592