Irradiation-induced improvement of crystalline quality of epitaxially grown Ag thin films on Si substrates

Applied Physics Letters

Volumn 69, Issue 19, 1996, Pages 2828-2830

  Takahiro, K ^a   Nagata, S ^a   Yamaguchi, S ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010910976     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117332     Document Type: Article

References (7)

1. H. A. Atwater, C. V. Thompson, and H. I. Smith, J. Appl. Phys. 64, 2337 (1988).
2. J. C. Liu, M. Nastai, and J. W. Mayer, J. Appl. Phys. 62, 423 (1987).
3. J. Nakata and K. Kajiyama, Appl. Phys. Lett. 40, 686 (1982).
4. I. Golecki, G. E. Chapman, S. S. Lau, B. Y. Tsaur, and J. W. Mayer, Phys. Lett. A 71, 267 (1979).
5. J. F. Ziegler, J. P. Biersack, and U. Littmark, The Stopping and Ranges of Ions in Solids (Pergamon, New York, 1985).
6. J. S. Williams and R. G. Elliman, in Ion Beams for Materials Analysis, edited by J. R. Bird and J. S. Williams (Academic, Sydney, 1989), pp. 327-330.
7. H. Ishiwara and S. Furukawa, J. Appl. Phys. 47, 1686 (1976).