Atomically flat gold film surfaces deposited on Si (111) surfaces at room temperature

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3013-3014

  Okamoto, H ^a,b   Nejo, H ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010595750     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590334     Document Type: Article

References (9)

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